Ion Implant System
Source: Varian, Inc.
The Kestrel II is a high energy ion implant system designed to meet the increasing demands of high-energy implant applications
Varian, Inc. II is a high energy ion implant system designed to meet the increasing demands of high-energy implant applications. The ion implant system features Varian's Tandetron tandem DC accelerator technology for higher productivity, guaranteed process integrity, improved reliability and the lowest cost of ownership.
The system's software allows handling of all types of implant processing, including chained implants. It is also designed to solve some of the traditional challenges associated with high-energy ion implantation, such as controlling the negative effects of photoresist outgassing. The end result is increased throughput, up to 200 wafers per hour for 200 mm wafers.
<%=company%>, 121 Hartwell Ave., Lexington, MA 02173. Tel: 781-861-7200 . Fax: 781-860-5437.
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