Inline Process Refractometer Brings Real-Time Liquid Concentration Measurement To Wafer Fabs
Utilizing inert non-metallic materials on all wetted parts, the instrument delivers continuous and accurate measurement in an application area currently dominated by more costly analyzers and time consuming laboratory-based analysis techniques.
PR-23-M provides an alarm if the chemical composition is not within programmed specifications. It is ideal for preventing out-of-spec chemicals from entering the semiconductor process, eliminating costly production quality problems.
K-Patents' PR-23-M is an all-purpose transmitter, and can be used to measure the concentrations of all kinds of process liquids such as HF, HCl, KOH, IPA, PGMEA, NMP, NH4OH, C2H6O2 and CH3COCH. The instrument installs directly into the process pipeline, and provides a continuous 4-20 mA or digital measurement signal.
A PTFE body and other non-metallic materials on the wetted parts ensures compatibility with ultra-pure chemicals, and the aggressive liquid compositions used in the semiconductor fabrication process such as etchants, photo resists, developers, strippers and cleaning agents.
The measurement is based on K-Patents' optical measurement sensor, which uses a solid-state CCD (charged couple device) camera to provide a digital measurement of refractive index, a technology that has made K-Patents both the largest and fastest growing supplier of process refractometers worldwide. Measurement accuracy is +/-0.0002 RI (which corresponds to +/- 0.1% by weight), and is not affected by bubbles, particles, or the color of the process liquid. Further, the PR-23-M has no calibration drift and requires no maintenance. Users can simply 'install-and-forget', providing a low total cost of ownership.
The sensor connects directly into the process pipe, and can be installed in less than an hour. Its compact, small footprint design, ensures that PR-23-M can be integrated into a wet bench or cabinet.
"This new instrument helps semiconductor facilities to address both process quality and speed of turnaround issues", notes Eric Gronowski, Manager of K-Patents, Inc. "We've already trialled its performance in a number of applications including monitoring the goods-inward quality of chemicals, and subsequent mixing and use in process stages such as silicon etching, and believe that there are many other applications in fabs that could benefit from real-time measurement".
K-Patents developed the instrument in response to requests from semiconductor manufacturers. The instrument is based on a digital sensor design, developed and refined over more than 20 years, and now used worldwide in a wide range of process industries including pulp and paper, chemicals and petrochemicals, textile manufacturing, and food and beverage processing.
SOURCE: K-Patents, Inc.