In-Line Batch Sputtering System
Source: KDF Electronic & Vacuum Services, Inc.
The 954 is an in-line batch sputtering system designed for processing Gallium Arsenide (GaAs) and other compound semiconductor applications
KDF Electronic & Vacuum Services, Inc.an in-line batch sputtering system designed for processing Gallium Arsenide (GaAs) and other compound semiconductor applications. The tool augments KDF's 900 series product family. KDF Electronic & Vacuum Services, Inc.available in the standard 954NT configuration and as the 954NTX, which offers the option of extended cathodes and increased uniformity.
The system is a four-target batch sputtering system, offering a 12x12 substrate area and small footprint. Cathode and wafer orientations are horizontal, translating to gentle substrate fixturing for users. The palletized system offers dual-level hi-vacuum pumped loadlock and high-speed batch processing features. The system allows for high utilization that increases both cost-effectiveness and productivity. In addition, the system has the capacity for high-rate DC magnetron sputtering and single or multiple pass deposition.
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