ICP-MS System
Source: Hewlett Packard Company
The HP 4500 Series 300 ICP-MS system is designed for use in semiconductor labs measuring ultra-trace contaminants in process chemicals and silicon wafers
Hewlett Packard Company Series 300 ICP-MS system is designed for use in semiconductor labs measuring ultra-trace contaminants in process chemicals and silicon wafers. With a guaranteed specification of 240 million counts per second/PPM analyte, this series is an order of magnitude more sensitive than the previous model. At better than 3ppt, the guaranteed detection limit for Fe is five times lower than the previous model. Capable of high-power (900W - 1000W) cool-plasma conditions, the system can analyze sample matrices such as mixed chemicals, sulfuric acid and resists. The sample inlet system features a low-flow Pt-tipped cross-flow nebulizer, Peltier cooled quartz-spray chamber, quartz ICP torch, and Pt interface cones. Options include a polypropylene spray chamber, solid Pt torch injector, and an inert fitting kit for resist analysis.
<%=company%>, 2850 Centerville Road, Wilmington, DE 19808. Tel: 800-227-9770. Fax: 302-633-8911.