High Productivity i-Line Lithography Stepper

Canon USA, Semiconductor Equipment Divisionpany%>, Semiconductor Equipment Division, has introduced the FPA-3000i5+, a high productivity i-line stepper that delivers enhanced optical performance, better overlay and higher throughput than the company's earlier models.

Based on the FPA-3000i5 chassis, the new stepper includes a high numerical aperture (NA 0.63) and the ability to print features smaller than 0.35 microns, making it well-suited to the volume manufacturing of 64 Mb and higher DRAMs.

Canon designed the i5+ as a mix-and-match companion for its FPA-3000EX5 DUV stepper. The two models together will provide a high productivity option for companies wanting to extend their current asset base by staying with 5X (5:1 reduction ratio) steppers as long as possible.

The i-line stepper includes Canon's fast linear motor air-guided tilting (FLAT) stage and a "Smoothing Focus" feature that operates on-the-fly to maximize throughput by beginning focus measurement and stabilization during stage-stepping. An improved advanced global alignment (AGA) scheme further reduces measurement time.

The user-interface console of the FPA-3000i5+ features an upgraded color user-interface console, similar to that used in the FPA-3000EX5, facilitating easy command input and high-speed communications.

Canon will introduce the FPA-3000i5+ at the SEMICON/Europa '98 exhibition in Geneva, Switzerland, March 31 - April 2.

Specifications

• Lens Magnification 5:1 Reduction Ratio
• NA 0.45-0.63 Variable
  
• Resolution Less than 0.35 micron
• Exposure Field 22 x 22mm
• Illumination 365nm
  
• Wafer Size Maximum 8 inches
• Reticle Size 6 inches
  
• Alignment Accuracy Less than 40nm (|m|+3sigma)
• Throughput 100 WPH (8-inch wafer, 90mJ/cm2)

Canon U.S.A., Inc., Semiconductor Equipment Div., Tel: 972-409-7800.