HFV Variable-Frequency (~2 MHz) Generators: Power for PVD, CVD, and Etch Applications

Advanced Energy Industries, Inc.ries of generators offers output power levels of 3 kW, 5 kW, and 8 kW. The HFV is designed primarily for use as a plasma generator with 200 mm and 300 mm wafer processing equipment. Typical process applications include PVD, PECVD and etch.

The HFV provides flexibility though digitally-synthesized variable frequency output and microprocessor control. The output frequency range is 1.765 MHz to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure reliable operation with a wide variety of chamber configurations and process recipes.

Process consistency is ensured through AE's sense-and-control technology. In load power regulation mode, the power dissipated in the plasma is accurate to within 4% of setpoint and is consistent from run to run.

In order to reduce the over-all cost of ownership, the HFV has been designed for superior reliability. In addition, the HFV has self-diagnostic capabilities, which provide an operating history and test for 14 different types of internal supply failures. These diagnostic tools enable the equipment technician to de-bug problems before they occur. The supply may be tested without the use of special test fixtures, merely by using the safety cover to verify operation with an open load.

<%=company%>, 1625 Sharp Point Drive. Fort Collins, CO 80525. TEL: 970-221-4670; FAX: 970-221-5583.