Film Thickness Metrology Tool
Source: Karl Suss America
The KT-22 is designed to allow non-destructive measurement of film thicknesses
Karl Suss Americas designed to allow non-destructive measurement of film thicknesses. The system is capable of highly accurate, non-contact measurements of photoresist film thicknesses from 20 nanometers thru to 90 microns and greater.
The system can be used to measure non- or weakly-absorbing materials such as resists, oxides, nitrides and polysilicon on silicon, GaAs, metal, and other substrate materials.
The product is a tabletop system with a footprint of 0.75 meters deep by 0.9 meters wide. It incorporates innovative design features including a precision stage, built-in reference, network ready computer, and Wafermap advanced mapping and statistical process control (SPC) software from Boin, GmbH. This software allows the user to quickly view, edit, and analyze measured data from the KT-22.
<%=company%>, 228 SUSS Drive, Waterbury Center, VT 05677, Tel: (+1) 802-244-5181, Fax: (+1) 802-244-5103
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