Ferran Scientific
Our feature product the Micropole RGA, is used for a wide variety of process monitoring, fault detection, and process control applications in the Semiconductor industry for the purpose of recovering lost profits from operations in manufacturing environments.
The Micropole RGA operates in pressure regimes for in situ application up to 10 mtorr, allowing the Micropole to be used directly in situ for process monitoring in sputter tools without additional costly pumping systems. The high pressure operation also has advantages in monitoring early on in the pumpdown of a tool after a preventative maintenance and chamber clean, to diagnose the vacuum integrity of a manufacturing system. Virtually any process environment can benefit from the use of a Micropole RGA. Mass ranges to 300 AMU and resolution as good as .5 AMU are available in this interchangeable component level system. Turn-key integrated systems (Quartet System) with built in display and computer are available. We have atmospheric sampling systems for corrosive process monitoring or applications whose pressure is above 10 mtorr such as LPCVD, APCVD, and diffusion furnaces.
We look forward to serving you.