FE VII-SD

Rudolph Technologiesl wavelength FE VII-SD is a production metrology tool built around a FOCUS ellipsometer. This tool measures films using multiple wavelengths and multiple angles of incidence. It gives measurements for even the thickest films, while keeping the inherent accuracy of a true ellipsometer when measuring the thinnest. The metrology system also handles multi-layer film stacks and complex multi-parameter composition measurements.

The product produces unambiguous results because one fully capable measurement system is used for all applications from thick polyimide to the thinnest gate oxide. Its HeNe primary provides the wavelength accuracy of an atomic transition. This eliminates the need for internal reference standards and time-consuming reference checking. It is suitable for use in applications for CMP, CVD, diffusion, etch and lithography.

<%=company%>, One Rudolph Road, Flanders, NJ 07836. Phone: (973) 691-1300. Fax: (973) 691-5480.