Excite Particle Detection System

Applied Materials, Inc.system is a high-speed particle detection system for monitoring the condition of process tools using either blanket or patterned wafers. Helping to minimize cost-per-die by identifying particle excursions immediately after processing, Applied Materials, Inc.system also reduces the need for using costly, production-limiting, non-product wafers, significantly increasing overall fab equipment efficiency.

High throughput is a key part of Applied Materials, Inc.system's economics. Most blanket films can be inspected by Applied Materials, Inc.system at over 60 wafers per hour (wph), and patterned wafers at over 45 wph. The system's footprint is the smallest of its kind, providing the highest output per unit area.

The system's high sensitivity and throughput are the result of dedicated optical heads and specialized algorithms for each application. The optics for detection on blanket films are tuned for uniform and rough layers. A different set of optics is used when inspecting patterned wafers after etching.

<%=company%>, 3050 Bowers Ave., Santa Clara, California 95054. Tel: 408-727-5555; Fax: 408-986-8352