Product/Service

Excimer Laser

Source: Cymer, Inc.
The ELS-6010A 193nm excimer laser for photolithography is targeted at 130nm to 100nm process development and device manufacturing
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Cymer, Inc.emicon West 2000

The ELS-6010A 193nm excimer laser for photolithography is targeted at 130nm to 100nm process development and device manufacturing. The ELS-6010A is a 2kHz, 10W laser providing leading edge optical performance. Highly line-narrowed bandwidth, less than 0.5pm @FWHM and 1.3pm @ 95 percent energy, enables high contrast imaging from lithography scanners offering lens NA over 0.75.

The ELS-6010A incorporates new technology for pulsed power, the discharge chamber, and wavelength stabilization to enable tight control of optical bandwidth and exposure dose (<+/-0.3 percent, 50-pulse window). In-situ laser metrology provides pulse-to-pulse data acquisition and control to minimize transient wavelength instabilities, thereby enhancing exposure latitude and CD control. The ELS-6010A has an operating cost reduced 60 percent from the ELS-5000A developmental 193nm laser.

<%=company%>, 16750 Via Del Campo Court, San Diego, CA 92127-1712, Tel: 858-385-7300, Fax: 858-385-7100