Equal Soak Algorithm

Solid State Equipment Corporation has improved performance of its solvent processors by implementing a new even soak timing in the immersion step. SSEC's solvent processors, with applications for metal lift-off and resist stripping, combine batch immersion with single wafer processing. The new even soak algorithm ensures that each wafer receives the same time in the solvent immersion station.

Batch immersion in the solvent process, with controlled agitation and heating of the solvent bath, complements the single wafer processing in which each wafer is treated individually in a processing and rinse chamber. Single wafer processing enhances process precision and allows on-demand processing.

SSEC solvent processors are available in sizes and configurations to handle wafers to 300 mm and glass panels up to 1 meter square.

Solid State Equipment Corporation manufactures a full line of spindle cleaners/processors and hermetic package sealers at its headquarters in suburban Philadelphia. These systems are complemented with application-specific components and supporting systems, including chemistry management systems and environmental systems for sealers. SSEC maintains sales and service offices worldwide, and customer support and process development centers in Horsham, Pennsylvania, Fremont, California, Regensburg, Germany, and Tokyo, Japan.

Solid State Equipment Corporation, 185 Gibraltar Road, Horsham, PA 19044. Tel: 215-328-0700; Fax: 215-328-9410.