Epitaxial Deposition System

Mattson Technology, Inc.5000 is an epitaxial silicon deposition system that deposits silicon films on wafers up to 200 mm in diameter. It is designed to provide superior uniformity and high throughput (processing up to 36 150-mm in a batch). Featuring a 95% or greater up time, the dual chambered system can process epitaxial silicon thicknesses from 1 to more than 100 microns with tight process control. A patented bell-jar design provides uniform delivery of reactant gases over a large area wile an ex-situ fiberoptic sensor measures temperature on the back side of the susceptor, so that temperature repeatability is not affected by the deposition process.

<%=company%>, 3550 W. Warren Avenue, Fremont CA 94538. Tel: 800-MATTSON. Fax: 510-657-0165.