EpiPro Systems

The EpiPro Series is the next-generation, cost-effective Epi reactor for epitaxial deposition. Specifically designed for growing Epi layers on 75mm to 200mm silicon wafers, the EpiPro system supports long processing times at high temperatures with a high degree of thickness and resistivity uniformity across the wafer, while minimizing silicon lattice defects.

A combination of features provides the EpiPro reactors with significantly improved film quality and cost of ownership through high wafer throughput. The dual chambered EpiPro 5000 is the only epitaxial reactor that has the flexibility to process a broad range of epitaxial silicon thicknesses, from 1 to more than 100 microns, with tight process control for all film thicknesses. The chamber's patented, bell-jar design provides uniform delivery of reactant gases over a large area. An ex situ fiberoptic sensor measures temperature on the back side of the susceptor, so that temperature repeatability is not affected by the deposition process. To further improve temperature uniformity and to minimize slip, RF coupling to the susceptor has been dramatically enhanced by lowering the RF frequency to 25 kHz. The dual chambered EpiPro processes up to 36 150mm wafers, the largest epitaxial batch size available today, for a 50 percent improvement over competitive equipment. The systems can be installed side by side, allowing for an additional 30 percent throughput per floorspace savings. These features, plus 95 percent or greater uptime, combine to give the EpiPro 5000 the lowest cost of ownership within this equipment class.

Mattson Technology, Inc., 3550 W. Warren Avenue, Fremont, CA 94538. Tel: 510-492-5923; Fax: 510-657-0165.