ECLIPSE 300

Introducing the ECLIPSE 300, SCP's innovative solution to 300mm surface preparation needs. This second generation tool combines dilute chemistries and industry-leading drying capabilities with production-level process experience for 130nm and beyond processing.
This modular, self-contained tool requires no remote support equipment and is over 35% smaller than the first generation 300mm tool. Each ECLIPSE 300 process module features an individual stainless steel frame and rotomolded plenum for secondary leak containment.

ECLIPSE 300 Process Features/Benefits:

Industry-leading GreenDry CI (Chemical Inject) capable of HF, HCl, or ozone inject for cleaning and silicon surface preparation with integrated rinse/dry
Single-use dilute chemistry SC1 megasonics tank
Technology target: 130nm and beyond
Small tank volumes (@ 10 gallons) for chemical savings
Advanced data collection and process monitoring capabilities
Conformal tanks and SCP patented 300mm process cassette for optimized process, fluid flow, CoO and wafer handling
Traditional tank options:

• Filtered, recirculated process module with megasonics option
  
• OFR and QDR rinse tank

ECLIPSE 300 Automation Options:

Single wafer transfer

• Supports variable pitch processing
  
• Supports partial FOUP processing
  
• OCR option
  
• Notch alignment option
  
• Face-to-face processing

Batch wafer transfer

• OCR option (first wafer only)
  
• Notch alignment option
  
• Face-to-face processing

FOUP buffering:

• Twelve-FOUP buffer
  
• Supports overhead delivery
  
• Supports AGV
  
• Supports PGV

SCP Global Technologies, 400 Benjamin Lane, Boise, ID 83704. Tel: 208-685-5000; Fax: 208-685-4540.