Product/Service

DUV Stepper

Source: Canon USA, Semiconductor Equipment Division
The FPA-3000EX6, the deep-UV stepper with an ultra-low aberration NA 0.65 lens, can expose 117 wafers per hour

The FPA-3000EX6, the deep-UV stepper with an ultra-low aberration NA 0.65 lens, can expose 117 wafers per hour. This product features a stepper lens that is designed for use with Canon's IDEAL resolution enhancement technique. IDEAL multilevel imaging is a method for achieving a process k1 factor of 0.3 with ordinary optical lithography tools. Using this technique, the EX6 can image circuit features below 120 nm with good process latitude. Batch streaming software maximizes EX6 throughput for any lot size. The EX6 achieves throughput rates of 117 WPH on 200 mm wafers.

Specifications:

  • Reduction ration: 5:1
  • NA: 0.50-0.65
  • Resolution: 0.15 micron
  • Exposure field: 22mm x 22mm
  • Exposure wavelenth: 248nm
  • Light source: KrF excimer laser
  • Wafer size: 200mm maximum
  • Reticle size: 6-inch square,0.25-inche thickness
  • Overlay accuracy: less than 30nm
  • Throughput: 117 WPH

    • Canon will exhibit this stepper at SEMICON/Europa'99 in Munich, Germany, April 13-15, 1999.

    Canon USA, Semiconductor Equipment Division, 3200 Regent Blvd, Irving, TX 75063-3145. Tel: 972-409-7800. Fax: 972-409-7849.