DuPont Photomasks Expands Production Capabilities for DUV Pellicles

DuPont Photomasks, Inc. (DPI) has expanded capacity at its Danbury, Conn. facility to double production capabilities for deep ultraviolet (DUV) pellicles, the ultra-thin, frame-mounted pieces of transparent film that cover photomasks to create a sealed, contaminant-free environment.

The material used to fabricate a pellicle must be compatible with the light source employed to pattern the circuit images onto the semiconductor wafers. For example, a pellicle designed to work exclusively with the i-line steppers that are currently widely deployed will degrade rapidly under repeated exposure to the light wavelengths emitted by DUV steppers.

"The industry is undergoing a much more rapid transition to DUV technology than anyone originally anticipated," said J. Michael Hardinger, chairman and chief executive officer of DuPont Photomasks. "As the world's largest supplier of deep sub-micron photomasks and DUV pellicles, we are committed to staying ahead of the curve to ensure that we meet the needs of the leading edge of the photomask market."

DPI produces of photomasks that enable the production of semiconductor devices with 0.35-and-below micron design rules. DPI also manufactures photoblanks, the polished quartz plates coated with very thin layers of chrome and photoresist that are used to make photomasks.

Industry analysts at Dataquest now predict that DUV stepper shipments will roughly double from 1997 to 1999, ramping from 300 steppers per year to nearly 600 units. VLSI Research analysts estimate that the market for DUV tools will experience a compound annual growth rate of 43.9 percent between 1997 and 2002.

The material DPI uses to fabricate DUV pellicles was patented while the company was still a business unit of parent E.I. du Pont de Nemours and Company. Known as Teflon AF, the material in pellicles is now intellectual property of DPI. Since the most minute speck of dust can render a photomask useless, pellicles designed to work with DUV steppers are essential for the advancement of the industry.

Teflon AF has been formulated to provide superior transmission with both 248 nm DUV light wavelength and 365 nm i-line light wavelength. Pellicles made with Teflon AF deliver the multi-wavelength compatibility without experiencing extraordinary degradation under either light source.

DuPont Photomasks, Inc., Tel: 512-310-6559.