Drying System

The new AVID IPA drying system for semiconductor and flat panel display substrates features all the process benefits of advanced Marangoni drying without the hazards and complexities of creating IPA vapor. The delivery system atomizes IPA (isopropyl alcohol) into microscopic liquid droplets, which effectively create the differential surface tension drying without the need for IPA heaters and IPA vapor safety equipment.

The system has been designed and optimized for silicon, gallium arsenide, and other III-V wafer drying applications. Ultra-high purity materials and an emphasis on particle performance at 0.16µm particle size provide the extreme cleanliness required for today's quarter micron and smaller integrated circuit geometries. The system can dry silicon wafers up to 300mm in size, III-V wafers to 150mm and flat panel displays to one meter. It can be integrated into a wet bench or used as a turnkey, point-of-use dryer.

N/A, 2632 Bayshore Parkway, Mountain View, CA 94043. Tel: 650-903-0304; Fax: 650-903-9023.