Deposition System

The Sequel Express chemical vapor deposition (CVD) tool is designed to deposit Novellus' Coral family of low dielectric constant (low-k ) films, as well as all other advanced dielectric films required for 0.18-micron and smaller devices.

With a maximum throughput in excess of 110 wafers per hour (wph), the system delivers a high capital productivity, a high footprint productivity, and a low cost of ownership, according to the company. A 300 mm version of the tool is also available.

The deposition system leverages the Sequel platform's multi-station sequential deposition architecture. Each wafer is processed through the same path as every other wafer in the lot. Six sequential deposition layers prevent the propagation of pinholes and provide enhanced copper-diffusion blocking even with ultra-thin films. Power densities are approximately one-third the level used in single-wafer and mini-batch reactors. This enables volume production with high device yields and damage-free processing.

Novellus Systems Inc., 4000 North First Street, San Jose, CA 95134. Tel: 408-943-9700. Fax: 408-943-3422.