Copper Plating Pulsed DC Power Supply
Source: Advanced Energy Industries, Inc.
The E-Wave bi-polar pulsed dc power supply is designed for the copper plating phase of dual-damascene process flow (DDPF) applications
Advanced Energy Industries, Inc.bi-polar pulsed dc power supply is designed for the copper plating phase of dual-damascene process flow (DDPF) applications. The compact supply has four, independently-controlled pulsed dc channels with versatile waveform construction. Each channel stores 15 waveforms as well as 15 recipes. The supply features host computer control, four-terminal control and measurement of voltage at the wafer, and high current capability.
<%=company%>, 1625 Sharp Point Dr., Fort Collins, CO 80525. Tel: 970-221-4670. Fax: 970-221-5583.
This website uses cookies to ensure you get the best experience on our website. Learn more