Product/Service

Compass System Inspects Defects at Production Throughputs

Source: Applied Materials, Inc.
Applied Materials, Inc. announces its new Compass system, the industry's first patterned wafer inspection system to detect critical defects in devices with design rules as small as 100 nanometers and below at the high speeds required for chipmakers' volume production lines
Applied Materials, Inc.erials, Inc. announces its new Compass system, the industry's first patterned wafer inspection system to detect critical defects in devices with design rules as small as 100 nanometers and below at the high speeds required for chipmakers' volume production lines. Featuring new OmniView imaging technology, single button recipe set-up and On-The-Fly (OTF) defect grouping, the Compass system allows users to rapidly detect a wide range of process problems in-line for early correction and minimal yield loss.

The Compass system features OmniView multi-perspective laser scanning technology that compiles information from six different scattering directions to ensure the robust detection of a variety of defect types across all process layers. The system's high scanning speed enables throughputs up to 60 wafers per hour, depending on the selected scan mode.

As the wafers are scanned, the Compass system's unique OTF grouping capability automatically sorts all detected defects into coarse bins, separating critical from nuisance defects for tighter excursion control. On-The-Fly grouping also allows optimal use of Applied Materials, Inc.erials' leading-edge SEMVision cX defect review system for rapid, automatic classification and identification of the defects' source.

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