Compact Reactive Ion Etching System
Source: SAMCO International, Inc.
One-button operation after set up of recipe
One-button operation after set up of recipe. Accomodates one 4 inch wafer or multiple die or packaged devices. Audio alarm signals completion of run. Safety features protect system and operator. Sleek, compact design takes minimum space in clean room. Optional small footprint cart saves benchtop space.
For more detailed information regarding this system please go to: http://samcointl.com/rie-1c.HTML
SAMCO's RIE-1C is the ideal solution for laboratories with planar ion-assisted etching requirements and very little benchtop space. This high-performance system is engineered to optimize etching rates, uniformity and selectivity and is specially well suited for removing passivation materials for failure analysis.
SAMCO International, Inc., 532 Weddell Drive, Suite 5, Sunnyvale, CA 94089. Tel: 408-734-0459; Fax: 408-734-0961.
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