CMP Slurry Cleaning Systems

The Texwipe Company Company LLC has introduced two new chemical mechanical planarization (CMP) slurry cleaning systems for process tooling and environmental surfaces. The CMP Tungsten Slurry Cleaning System is a two-part cleaning system for removing residues from ferric-based CMP tungsten slurries. The CMP Oxide Slurry Cleaning System is a three-part system for removing residues from CMP oxide slurries.

The two-part Tungsten Slurry Cleaning System is composed of TX8606 SCS 20 Tungsten Slurry Cleaner and TX8608 SCS 100 Final Wipedown. The Cleaner, consisting of Texwipe's AlphaWipe polyester wipers pre-wetted with cleaning agent, dissolve and remove ferrous oxide deposits created from tungsten slurry. The Final Wipedown component, consisting of Texwipe's Honeycomb 10 polyester wipers pre-wetted with 3% TexPure solution, remove the slurry cleaning agents and remove any last traces of ferrous oxide created from the slurry.

The three-part CMP Oxide Slurry Cleaning Systems consists of TX8065 SCS 10 CMP Oxide Slurry Cleaner, TX4403 ScourWipe and TX8608 SCS 100 Final Wipedown. The Cleaner, which consists of ultraclean nylon wipers pre-wetted with a cleaner, re-disperses the deposited oxide slurry for easy clean-up. The use of ScourWipe is recommended for removal of exceptionally hard deposits of oxide slurry. The Final Wipedown, consisting of ultraclean Honeycomb10 polyester wipers pre-wetted with 3% TexPure solution, are effective in removing the slurry cleaning agents and for removing any last traces of oxide slurry.

Each element of The Texwipe Company CMP Slurry Cleaning Systems is packaged in an easily distinguished blue laminate FlatPack which can be wiped down prior to introduction into the cleanroom and features a convenient resealable label for dispensing single pre-wetted wipers. Each FlatPack contains 50 wipers measuring 9" X 9" with 12 FlatPacks to a case.

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