Cluster Productivity System
Source: Silicon Valley Group Inc., Track Systems Division
The ProCell DUV Coat/Develop cluster system is designed for use for both 200 and 300 mm wafers
The ProCell DUV Coat/Develop cluster system is designed for use for both 200 and 300 mm wafers. This hexagonal cluster platform and patented synchronous scheduling is focused on improving process consistency at 250 nm and beyond. The cluster system completes the lithography process in 12 moves.
This system allows for the processing of more than 40 wafers simultaneously with varying position, time requirements and sequencing. A patented synchronous scheduling algorithm called Advanced Guidance System optimizes wafer movement by calculating the optimal wafer path before movement is initiated, resulting in the transport of each wafer at the precise moment necessary for consistent process results.
The close-packed hexagonal cell structure, three-axis system and bidirectional thermal modules enabled its simple robotics design.
Silicon Valley Group Inc., 2240 Ringwood Avenue, San Jose, CA 95131. Tel: 408-434-0500. Fax: 408-434-0216.