CLEAN TRACK ACT 8 System for Spin-On Dielectric (SOD) Applications

The CLEAN TRACK ACT 8 debuted in the coater/developer marketplace in 1997 to handle 200mm wafers. The ACT 8 features spinner modules, thermal processing units, and an optical edge bead removal unit integrated with the stepper interface. These advances reduce the ACT 8 footprint by 30% from traditional layouts.

Increased wafer transport speed and reduced overhead times allow the CLEAN TRACK ACT 8 to handle as many as 120 wafers per hour. The ACT 8 platform includes proven technologies to meet challenges in DUV and I-line processing. Customers are using the ACT 8 to process geometries ranging from 350 nanometers to 180 nanometers and beyond.

The CLEAN TRACK ACT 8 system for spin-on dielectric (SOD) applications brings advanced processing capability to the SOD market. The platform features innovations for SOD processing such as special coating and cup cleaning options for viscous and high vapor rate materials and special ovens for advanced low-k materials. Oven options include high temperature curing and low oxygen curing for oxygen sensitive materials. Advanced spin-on dielectric processing of low-k materials are available on the CLEAN TRACK ACT 12, TEL's 300mm track system.

Tokyo Electron America, Inc., 2400 Grove Blvd., Austin, TX 78741. Tel: 512-424-1000; Fax: 512-424-1034.