Product/Service

Cheetah 200 Asher

Source: Matrix Integrated Systems, Inc.
The fastest 200mm asher on the planet and that's not all
Advanced Single Wafer Photoresist Ashing System

The fastest 200mm asher on the planet
and that's not all...

The Cheetah 200 platform is a high throughput, single-wafer 200mm wafer processing platform with dual process chambers. Cheetah is capable of integrating either of Matrix' 3 basic plasma process technologies: Downstream microwave Ash/etch, Chemical Dry Etch (CDE) with dual plasma sources, or Reactive Ion Etch (RIE). The Cheetah 200 platform features the industry's most advanced system control software and DeviceNet for system level control.

Available Models

Cheetah 200mm Platform Highlights
1. Compact: 37" wide and accommodates Adjacent Side-by-Side installation
2. Dual cassettes for continuous processing.
3. 'No-damage' ashing, proven by CHARM 2™ monitor wafers

Cheetah Model 200, with SMA
1. Virtual Load Lock ™ - non-stop processing and near zero wafer transfer/prep overhead.
2. Synchronous Mutliplexed Architecture ™ - minimized system complexity
3. Dual chamber platform with ashing throughput >200 WPH

Cheetah Model 288
Dual, independent microwave chambers, quartz or sapphire sources, featuring flexibility for processes with longer process times, or high throughput resist strip, up to 175 WPH

Cheetah Model 277
Dual, independent chambers, for RIE etch and clean processes

Cheetah Model 299
Dual independent CDE chambers, each with sapphire microwave and RIE sources, for strip/etch residue removal and advanced processing

Matrix Integrated Systems, Inc., 4050 Lakeside Drive, Richmond, CA 94806. Tel: 510-222-2727; Fax: 510-243-2288.