CHARM-2 Wafer Charging Monitors
Source: Wafer Charging Monitors, Inc.
CHARM-2 monitor wafers offer fab engineers the ability to measure the charging characteristics of plasmas or ion
What Charm-2 Wafers Do
CHARM-2 monitor wafers offer fab engineers the ability to measure the charging characteristics of plasmas or ion beams before product wafers are exposed to them. Comparison of equipment charging "fingerprints" obtained during periods of reduced yield immediately identifies the offending equipment. Routine use of re-usable CHARM-2 wafers as equipment monitors to detect equipment drift, or to optimize processes, can prevent costly problems before they occur.
The re-usable CHARM-2 wafers are first calibrated and programmed on a parametric tester, then placed in a process chamber and exposed to a short version of the process to be tested. The collected charge or UV produced by this process alters the threshold voltage of the EEPROM transistors in the CHARM-2 sensors. The CHARM-2 wafers are then tested on a parametric tester (any of several standard makes and models) to collect the charging data, after which they can be re-programmed on the same parametric tester to get them ready for the next application. In this way, the same CHARM-2 monitor wafers may be used again and again to quantify the charging characteristics of any IC process equipment, including ion implanters, resist ashers, plasma etchers, and plasma deposition systems.
CHARM-2 monitor wafers offer fab engineers the ability to measure the charging characteristics of plasmas or ion beams before product wafers are exposed to them. Comparison of equipment charging "fingerprints" obtained during periods of reduced yield immediately identifies the offending equipment. Routine use of re-usable CHARM-2 wafers as equipment monitors to detect equipment drift, or to optimize processes, can prevent costly problems before they occur.
How Charm-2 Wafers Are Used
The re-usable CHARM-2 wafers are first calibrated and programmed on a parametric tester, then placed in a process chamber and exposed to a short version of the process to be tested. The collected charge or UV produced by this process alters the threshold voltage of the EEPROM transistors in the CHARM-2 sensors. The CHARM-2 wafers are then tested on a parametric tester (any of several standard makes and models) to collect the charging data, after which they can be re-programmed on the same parametric tester to get them ready for the next application. In this way, the same CHARM-2 monitor wafers may be used again and again to quantify the charging characteristics of any IC process equipment, including ion implanters, resist ashers, plasma etchers, and plasma deposition systems.
Wafer Charging Monitors, Inc., 127 Marine Rd., Woodside, CA 94062. Tel: 650-625-0422; Fax: 650-851-2252.
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