CD SEM Systems

KLA-TencorCorp. has introduced a new generation of in-line critical dimension scanning electron microscopes (CD SEMs) that address the monitoring challenges for lithography and etch applications that chipmakers face as they transition to the 0.13-micron node and 300-mm manufacturing. The 8200 Series (for 200-mm wafers) and 8400 Series (for 300-mm wafers) CD SEM tools combine high throughput, advanced imaging, superior measurement precision and enhanced productivity capabilities in a new Windows NT-based platform.

The new CD SEM systems have options for a high-precision laser stage interferometer and automated recipe creation (ARC) software. The high precision laser stage improves the total time between measurements from 6 - 9 seconds down to 3 - 5 seconds for most production uses. It also eliminates the need for extra pattern recognition steps that are complicated and time consuming for engineers to set up.

The systems incorporate KLA-Tencor's new Charge Equalization (CEq) capability. CEq enables precise, automated metrology on charge-sensitive materials that are difficult to measure with traditional CD SEM tools. These materials include highly insulating oxide layers, nitride layers and low-k dielectric films. Precision improvements of up to 40 percent can be obtained with the new systems, positioning the 8200/8400 Series among the highest precision CD SEMs now available.

The 8200/8400 Series tools also feature KLA-Tencor's automated pattern quality confirmation (pQC) capability, which enable the tools to go beyond traditional CD measurement data to provide feature shape and multi-dimensional profile information.

<%=company%>, 160 Rio Robles, San Jose, CA 95134. Tel: 408-875-4200.