Cabot Announces Introduction Of New CMP Polishing Pads
The company believes that the Epic D100 pad is a major breakthrough in CMP polishing pad technology. Currently used in high volume manufacturing by integrated circuit device manufacturers, the Epic D100 is the result of extensive research intended to deliver a step change improvement in CMP pad life and pad-to-pad consistency. Customers are using the Epic D100 for dielectric, shallow trench isolation, tungsten and copper processes.
Cabot Microelectronics Corporation is establishing manufacturing capabilities to support worldwide customer demand for the Epic D100. This includes manufacturing capability for the production of 400,000 intermediate CMP pads annually. The Epic D100 can also be customized to match customer grooving requirements (current capacity of 120,000 pads annually) in facilities located in the United States and Asia. The Epic D100 pad is available for 200mm and 300mm wafer polishing, with or without a window to detect the polishing end point.
The Epic D100 pad is based on proprietary technology and a state-of-the-art manufacturing process designed to improve pad performance and significantly lower cost-of-ownership. The Epic D100 has demonstrated up to a 30% longer pad life than the conventional pad due to its material characteristics. The design features a single polymer material and is produced via a continuous single-sheet manufacturing process. This is designed to eliminate batch-to-batch and pad-to-pad inconsistencies found in the conventional pad.
The Epic D100 pad is manufactured with extensive quality control. In addition to testing the typical pad physical properties, Cabot Microelectronics Corporation has developed quality control methods that check every pad for groove dimensions and window integrity. The materials and technology behind the Epic D100 pad are protected by an international portfolio of patents.
William Noglows, Chairman, and CEO of Cabot Microelectronics Corporation said, "We believe slurry and pad consumable sets can enable a quantum leap in CMP polishing performance. As the industry leader in CMP slurry research and manufacturing, we understand the critical relationship between slurry and pads and the applied science required to provide maximum performance with optimal cost of ownership. As a result, we believe Cabot Microelectronics is uniquely qualified to offer customers the most advanced CMP polishing solutions and we are excited about this new addition to our robust product line"
For further information, you can visit www.cabotcmp.com
SOURCE: Cabot Microelectronics Corporation