Bi-Polar Pulse Power Supply

Advanced Energy Industries, Inc.ral bi-polar pulse power supply is a flexible plasma-process development tool available for dual-cathode sputtering. By offering independent control of the power delivered to each cathode, this sophisticated power supply delivers maximum performance for dual-cathode reactive-mode sputtering of single compounds and alloys. It also offers adjustable frequency and duty cycle as well as low-arc energy. As the next-generation research tool and production power supply, this unit delivers versatility and high-film quality.

Benefits

• Never before has the user been able to control the power to dual cathodes independently.
• This new technology gives the user new and expanded research possibilities.
• The user can now easily evaluate new thin-film alloys in his/her own lab.
• Users will enjoy enhanced film quality due to low-arc energy.
• The advanced flexibility of continuously adjustable frequency and duty cycle lets users evaluate new process ideas more quickly than ever before.

Features

• Independently selectable regulation modes and adjustable setpoints for each cathode in a dual-cathode system; regulation by current, voltage, or power.
• Adjustable frequency from 20 kHz to 50 kHz at full power and up to 70 kHz with power derating, in real-time during operation.
• Adjustable duty cycle from 25% to 75% real-time during operation.
• Very low stored output energy of 10 mJ.
• Extended arc handling responds to arcs in less than 5 µ s.
• Very wide voltage range of 100 to 1000 V, with peak voltage of up to 1500 V at the beginning of the pulse.
• Wide current range of 2 to 30 A.
• The 20 kW unit supports 10 kW for each cathode.
• Adaptive impedance matching.
• Superior communications standard.

<%=company%>, 1625 Sharp Point Dr., Fort Collins, CO 80525. Tel: 970-221-0108. Fax: 970-221-5583.