Betapure ™ CMP Catridges

Betapure™ CMP filter cartridges are high capacity depth filters optimized for oxide and metal slurries used in chemical mechanical planarization (CMP) applications. Betapure CMP filters are composed of all-polypropylene components and features a multi-zone "graded-porosity" design for the optimum level of particle classification. This novel construction provides enhanced flow characteristics, including low pressure drop, to minimize shearing of the slurry while providing superior service life.

The objective of a slurry filter is for the majority of particles to pass through it unchanged, while only removing the undesired or "oversized" particles. The oversized particle population is commonly referred to as large particle counts (LPC) and they typically form over time when the suspended particles in the slurry settle forming aggregates, agglomerates, and gels. Large particles can also be the result of ad verse shipping conditions, shearing, slurry drying, and interaction with other distribution loop components such as fittings, tanks, piping, valves, and pumps. These large particles can scratch metal and inter-level dielectrics potentially causing wafer defects. The Betapure CMP filter reduces large particle counts that can potentially reduce yields while maintaining the polishing characteristics of the slurry.

Features & Benefits

Graded Porosity Design

• Superior removal of hard and soft gel contaminants, for reduced defectivity and improved yields
• High contaminant holding capacity reduces downtime and increases overall equipment effectiveness
• The filters are "matched" to the slurry providing the optimum level of performance needed to dramatically reduce defect causing particles
• Provides a low pressure drop reducing the potential for fluid shear of the slurry

100% Polypropylene

• Low cartridge extractables, free of adhesives, binders, and surfactants
• Excellent chemical compatibility with low and high pH slurries

Quality Manufacturing

• ISO certified quality management system
• Non-contact welding reduces a potential source for contamination
• Manufactured and double-bagged in a clean environment to provide superior downstream cleanliness out of the package

Built to Exacting Specifications

• Provides a consistent quality of slurry enabling repeatability of the planarization process