Benchmark Technologies and KLA-Tencor Share Software Technology

Benchmark Technologies, a Lynnfield, MA-based designer and manufacturer of lithographic test reticles for the semiconductor industry, recently announced that KLA-Tencor (San Jose, CA) will utilize Benchmark's Phase Shift Focus Monitor Reticle in their new software.

Phase Shift Focus (PSF) is a software analysis package that, when partnered with Benchmark's Phase Shift Focus Monitor Reticle, provides a solution for characterization and evaluation of both stepper and lens, to quantify and automate stepper focus determination within the fab. This method also reduces the time required for stepper acceptance and qualification.

PSF is used to automate the collection and evaluation of data generated using the Focus Monitor Reticle. Applications include daily focus characterization, best focus determination, and evaluation of field curvature and tilt, total focus deviation (TFD), lens astigmatism, lens heating effects, stepper and/or lens qualification, and both wafer and chuck flatness. Focus variations both within the field and from field to field can be mathematically modeled to characterize a variety of focus-related errors.

The Focus Monitor Reticle has the unique ability to gather focus data from a single exposure, resulting in substantial savings in both time and cost. The Reticle is compatible with virtually all stepper equipment, allowing comparative analysis across several models, manufacturers, reduction ratios and lens types.

Demonstrations and information on KLA-Tencor's PSF Software, which was released on May 1st, will be available at next week's SEMICON West in Booth 426 of the Moscone Center's South Hall.

For more information: Craig Sager, Benchmark Technologies, 7 Kimball Lane, Bldg. E, Lynnfield MA 01940. Tel: 781-246-3303, fax: 781-246-0308.