Product/Service

Bare Reticle Stocker

Source: Tec-Sem AG
To better ensure the particle control on photo masks, Tec-Sem has incorporated the Particle Detection System (PDS) into their bare Reticle Stocker RS1100/6in
Tec-Sem AGnsure the particle control on photo masks, Tec-Sem has incorporated the Particle Detection System (PDS) into their bare Reticle Stocker RS1100/6in.

The Wafer Stepper can immediately start with the process, as the Reticles are 100% particle free on retrieval from the Reticle Stocker. After finishing the stepping process, the Reticle will be inserted into the transportation box (or cassette). The operator inserts the box into the Reticle Stocker. The box will be automatically opened, the bare Reticle will be identified by reading the barcode and depending upon the setting, it can be either stored in the shelves or inserted into the Particle Detection System to start the particle count. When the particle count is too high, there will be a warning at the operator interface. The operator can then retrieve the Reticle and reinsert it after cleaning to ensure that all Reticles in the Reticle Stocker (up to 1'400) are 100% particle free. One Reticle Stocker can hold up to 1'400 bare Reticle, with already inspected photo masks, on an area of 2.1m2 or 21,5f2.

The Particle Detection System is a tool for automatic inspection of photo masks specifically designed for simultaneous particle detection on the pellicle, as well as the glass side. The system is fully integrated into the Reticle Stocker and built for Class 1 clean room operation.
This data is displayed on the operator interface and/or forwarded to the Host via SECS/GEM. The customer can program the threshold level for the detection of particles on the photo masks.

The advantages are:

  • the Reticles can be checked for particles on each insert and/or retrieval
  • during the idling time of the Reticle Stocker, the stored photo masks can be automatically checked for particles
  • maximum up-time and no waiting time for the Wafer Steppers, as the Reticles no longer have to be scanned at the Wafer Stepper
  • costs can be reduced, as there is no more need for an inspection tool on each Wafer Stepper
  • incorporation a storage solution with a inspection tool in one system
  • the system has the capability to monitor if there were particles added during the transportation and/or during processing

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