AX7610 Chemical Downstream Plasma Source

The AX7610 is a microwave plasma source for downstream chemical etch applications, such as photoresist stripping and hard mask removal. With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen for resist stripping. The sapphire tube version is compatible with much more severe CF₄ and NF₃ chemistries for isotopic etch and other applications.

• Wide application range
  – strip and passivation
  – chamber cleaning
  – surface modification
  – reactive gas chemistry
• Sapphire or quartz discharge tube for fluorine and non-fluorine chemistries
• Patented conductively cooled design – allows high power and high throughput operation
• Turnkey systems available
  – easy to integrate
  – complete solution
  – automatching

N/A, 90 Industrial Way, Wilmington, MA 01887. Tel: 978-284-4000; Fax: 978-284-4999.