Automated Film Metrology System

Nanometrics Incc 9200 is an automated film metrology system designed to complement and improve equipment efficiency for semiconductor manufacturing. The system features the latest generation spectroscopic reflectometer, flawless pattern recognition, auto-focus, and auto-positioning stage and robotic wafer handling capabilities.

The system features auto-recipe deployment, thickness/refractive index/extinction coefficient mapping and a database with statistical analysis capability. Its synergy with Nanometrics Incc 9000 integrated metrology system allows for direct and complete recipe transferability; programs can be created on the standalone NanoSpec 9200 and transferred directly into Nanometrics Incc 9000 integrated system. Nanometrics Incc 9200 offers a spectral range of 400-800nm or 190-760nm, and uses advanced dispersion models and a patented absolute reflectivity measurement technique to measure a majority of the single and multi-layer film stacks used in IC production.

This system is capable of measuring over 200 wafers per hour, two to three times more wafers per hour than competitive platforms. The system's compact design offers the smallest footprint on the market, occupying less than half the amount of fab space as other comparable units.

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