Automated 300 MM Film Metrology System
The system features a deep-ultraviolet (DUV) to near-infrared (NIR) spectroscopic ellipsometer (SE) with a wavelength range of 190-1000 nm for accurate and precise measurement of new processes and materials, such as very thin ONO film stacks, ARC films and photoresists for 193 nm lithography. This is the only production-worthy metrology system that measures directly at 193 nm using SE and utilizes Fourier transform infrared (FTIR) technology, an essential tool to determine the dopant concentration level in doped films such as CVD low-k dielectrics.
Robotic automation provides the industry's smallest footprint for a dual-FOUP (Front Opening Unified Pod) 300 mm system while offering high throughput. Based on Windows NT, the software also allows for seamless recipe transfer from the standalone system to Nanometrics' Integrated Metrology platforms.
<%=company%>, 310 Deguigne Dr., Sunnyvale, CA 94086-3906. Tel: 408-746-1600. Fax: 408-720-0196.