APTOS 2(tm), In Situ Temperature Monitoring and Analysis for Plasma Processes
Source: SensArray Corporation
SensArray Corporation introduces APTOS 2TM (Active Plasma Thermal Optical
System) for in-situ wafer temperature uniformity measurement in plasma
processes, including etch, plasma strip and CVD
SensArray Corporation introduces APTOS 2TM (Active Plasma Thermal Optical
System) for in-situ wafer temperature uniformity measurement in plasma
processes, including etch, plasma strip and CVD. Collect real time data and
anlayze multiple process and equipment variables to determine specific
effets on wafer temperature at any time during the process sequence. APTOS
includes temperature measurement wafers instrumented with embedded
fiber-optic sensors, an optoelectronic interface, and a data analysis
system. The system provides in situ multipoint temperature measurement to
within 2 mm of the wafer edge under high density plasmas from -60°C to
420°C. Measurement accuracy is *1°C below 130*C, *2*C from 130* to 200*C,
and *3*C from 200*C to 420*C.
SensArray Corporation, 3410 Garrett Drive, Santa Clara, CA 95054. Tel: 408-330-5600; Fax: 408-330-5601.