API-5000

API-5000 Advanced Photomask Inspection System for sub-wavelength lithography is a high-speed inspection tool which supports sub 0.15 micron design rule lithography and offers IC makers an affordable and reliable option when selecting a high-performance high-sensitivity inspection tool. The system is fully compatible with advanced reticles such as phase shift, tri-tone, and optical proximity correction masks.

Applications for the API-5000:

• Inspection of patterned and unpatterned photomasks/reticles for sub 0.15 design rule and beyond lithography
  
• Compatible with advanced photomasks such as COG, PSM, OPC, phase shift and tri-tone
  
• Verify photomask quality just prior to use on the stepper/scanner
  
• Verify cleaning process
  
• Four surface detection

QC Optics, Inc., 46 Jonspin Road, Wilmington, MA 01887. Tel: 978-657-7007; Fax: 978-657-6077.