API-3000/5

API-3000/5 Automatic Pelliclized Photomask Inspection System inspects incoming photomasks for re-qualification after pelliclization, storage and before production use. The system detects foreign material defects down to 0.5µm in diameter. The API-3000/5 inspects both sides of a photomask and any protective pellicle coverings. This same tool is used in wafer fabs where integrated circuits are made to verify the cleanliness of a photomask before its use. The API-3000/5 can avoid yield loss from the presence of even one particle or other defect on a photomask causing the scrapping of millions of dollars of finished computer chips left undetected.

Applications for the API-3000/5:

• Plate size: 4" - 7.25" by 0.060 - 0.250" thick, including 3x5"
  
• Inspection of patterned and unpatterned reticle/photomask surfaces
  
• Inspection of OPC technologies
  
• Four surface inspection
  
• High throughput

QC Optics, Inc., 46 Jonspin Road, Wilmington, MA 01887. Tel: 978-657-7007; Fax: 978-657-6077.