Air-Gap CV Technology

Featured at Semicon West

An air-gap CV technology developed in Japan by Dainippon and successfully used in over 35 fabs in Japan will now be available worldwide through a distribution agreement with Solid State Measurements. Under the terms of this exclusive agreement, DNS will manufacture the integrated system (known in Japan as the CV 3000) and SSM will provide sales, training, service, and applications support worldwide. SSM will support existing DNS installations through its subsidiary SSM Japan. This integrated product will be marketed under the name SSM 3000 Nano GAP CV. It will complement SSM's existing line of integrated, state-of-the-art conventional and mercury probe CV systems.

DNS developed and patented the first non-contact, non-destructive CV system, which was introduced to the Japanese market in 1994. Since then, this technology has been successfully used in production control and process development in Japan. It has reduced the time required for CV measurements by eliminating the requirement to form a metallic or polysilicon gate while maintaining the reliability and accuracy of the CV technique.

The SSM 3000 Nano GAP CV system measures CV and Ct characteristics using a non-contact, non-destructive air-gap CV sensors; is capable of monitoring 200 mm and 300 mm wafers; includes a measurement chamber designed to exclude light and maintain thermal equilibrium conditions, which are critical to accurate CV measurements; is based on conventional, well-understood CV theory; measures the surface of processed wafers immediately following oxidation, or bare wafers immediately following epitaxial silicon growth; and includes software that provides mapping, control of measurement conditions and a variety of utility controls.

Solid State Measurements, Inc., 110 Technology Dr., Pittsburgh, PA 15275. Contact: Dr. Mark Wilson, 412-787-0620; Fax: 412-787-0630.