Advanced Diffusion Systems

Cosmos Factory, Incorporated has developed a new class of mini-batch horizontal 6 in., 8 in. and 12 in. Atmospheric Diffusion & LPCVD systems for the semiconductor industry. The MTF150, MTF200 and MTF300 are the results of the design goal to improve the process capability of standard horizontal technology. The systems provide high quality thin films required for deep sub-micron processes and are simple to use, easy to maintain, clean and efficient.

These systems are ideal for R&D, new process development and small production facilities. The MTF150 and MTF200 can both process up to 50 wafer runs. The MTF300 will process 25 wafers runs. By incorporating the latest technology into the design of these tools the industry is supplied with vertical quality process results at horizontal prices.

Benefits include:

• An increase of 10% to 15% power efficiency, reduction of system weight, improved reliability and a lower cost of ownership
• At better than 50 degree a minute temperature ramp, the process cycle times are decreased, compared to traditional batch furnace designs
• The modular design decreases overall system down time, due to the fact each system is fully independent
• Systems can be configured for front or rear quartz installation

Temperature range and uniformity:

Standard configuration: 200ºC to 1200ºC
Standard Flat Zone: 20 in.
Optional: 400 ºC to 1400ºC
Control: +/- 0.5ºC within the flat zone for processes above 400ºC

Gas Controls
± 1% Gas Flows for all Gas Channels
0.003 Micron filters on all gas feeds

Recipe entry / storage:
Local remote keypad or serial download from optional network controller
31 Recipes with up to 100 steps and 64 process segments per recipe

Current Processes Supported:
ATMOSPHERIC
Thin Oxide, Thick Oxide, Alloy, Anneal, POCL3, Reflow, Gettering and Low "K", Flare or ASP cure

LPCVD
CVD Poly, CVD Nitride, LTO410, TEOS, BPSG

Power Requirements:
208/240 VAC, 3 Phase, 4 wires, 300 amp service (other voltage services available upon request).
Additional 15 amp service per LPCVD pump.

MTBF > 1000 hrs.
MTTR < 2 hrs

Options include:

• Liquid Sourcery, our patented liquid source delivery system
• A 1400 degree C heater core, for those special high temp process requirements
• A 5 zone heater core, for improved flatness / tapering control of the working zone
• A HEPA filter system for the wafer handling area
• An enclosed nitrogen mini-environment
• External hydrogen torch to do clean oxide growth
• A TCA Bubbler to allow for "in system cleaning"
• An external networked controller per modular system that allows, the collection of user specified SPC data on a per run basis, process recipe storage, and maintains maintenance logs. Connections include serial RS485, RS232 and 10/100 MBit Ethernet operating in an NT environment

Process Uniformity
Current process uniformity results as reported by customers are coming in below the range of + / - 2 % across an 8" wafer and +/- 4 % across the boat and + / - 5 % across a 50 wafer run depending on the type of process, the thickness of the layer and the purity of the process gases / liquids used.

Cosmos Factory, Inc., 1240 Yard Ct. #D, San Jose, CA 95133. Tel: 888-970-6904. Fax: 408-971-6905.