654NTX In-Line Batch Sputtering System

The 654NTX in-line batch sputtering system is capable of integration with current systems and developed to provide increased volume capacity by enabling multiple substrate material processing, or "multiplexing."

Featuring new cathode selectable collimator technology, the system substantially increases lift-off performance, an enabling capability for sputtering, thereby raising the overall cost effectiveness. Four thicker and longer cathodes, available in Inset design, provide increased uniformity, utilization and life capability for next-generation applications, without abandoning proven, reliable processes. Further, the tool offers hi-vacuum, load lock and high speed batch processing. The system's small footprint, 12x12 substrate area and improved throughput provides users with better utilization of materials.

Developed for Gallium Arsenide (GaAs) and other compound semiconductor applications, it can also be applied to the full-range of next generation microelectronic component manufacturing. One of three new tools introduced by the company in the last 18 months, the 654 NTX is demonstrative of the company's commitment to constantly evaluating and providing new products and methods for its diversified customer base.

The worldwide market for batch in-line sputter and etch systems is worth approximately $200-$250 million per year. The systems are used in the production of GaAs integrated circuits, primarily marketed to the telecommunications industry. The company's systems are used in the production of electronic devices across multiple markets.

KDF Electronic & Vacuum Services, Inc., 70 S. Greenbush Rd., Orangeburg,NY 10962. Tel: 914-398-2000. Fax: 914-398-2222.