4 kHz Argon Fluoride (ArF) Laser

Cymer, Inc.anoLith 7000 argon fluoride (ArF) production laser is designed for next-generation lithography applications at the 193nm wavelength. Based on the ELS-6000 Series platform, the laser features a repetition rate of 4kHz, and enables the production of devices with 0.10-micron and smaller geometries.

Operating at a 4 kHz repetition rate, the laser is designed to support the highest scan speeds for maximum productivity and wafer throughput. Improved thermal management and optimized gas flow in the discharge chamber allow the laser to deliver 20-Watts average output power at up to a 100 percent duty cycle. Equally critical is the laser's ability to provide full, high-contrast imaging capability for 200 mm and 300 mm lithography steppers and scanners with greater than 0.75 numerical aperture (NA) lens designs. The laser delivers this level of spectral performance through a highly line-narrowed bandwidth less than 0.35 pico meters (pm) at full-width, half maximum (FWHM) and 0.95 pm at 95 percent energy.

The unit's built-in laser metrology delivers pulse-to-pulse data acquisition and feedback control to minimize transient wavelength instabilities, thereby, enhancing exposure latitude and CD control.

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