248nm Excimer Laser

Introduced at Semicon '98

Cymer, Inc., a supplier of the excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, has unveiled the newest addition to its excimer laser product line-the ELS-5010 krypton fluoride (KrF) 248nm laser.

The ELS-5010 will enable the manufacture of devices with design rules below the quarter micron threshold, which are currently moving from R&D into production.

Expanding upon the performance of Cymer's flagship ELS-5000, which is designed for refractive exposure tools with 0.6 and smaller numerical aperture (NA) lens designs, the ELS-5010 is specifically designed to address next-generation stepper and scanner applications with 0.7 NA lens designs-offering tighter resolution capabilities through narrower bandwidths

To address the resolution requirements for 0.7 NA lens designs, the ELS-5010 provides bandwidth narrowing less than 0.6 picometer (pm). The laser offers energy stability < + 6 percent to maximize CD control and increase device yields.

The ELS-5010 features a 1kHz repetition rate, output power exceeding 10W, and a pulse energy of 10 millijoules (mJ). The laser's modular construction design allows it to be serviced from one side-enabling floor space optimization, easy diagnosis and minimal system downtime. The ELS-5010 complies with all EMI and CE marking requirements.

Cymer, Inc., 16750 Via Del Campo Court, San Diego, CA 92127-1712. Tel: 619-451-7300; Fax 619-618-3035.