200mm/300mm Litho Tool Set
The new scanners, the FPA-5000ES3 and FPA-5000AS2, can handle critical layers down to 130nm and 100nm, respectively. Both scanners also incorporate many features for extendibility into the low k1 lithography realm. In anticipation of more usage of reticle enhancement techniques, including its own IDEAL technology and other double-exposure methods, Canon has designed its newest scanners with faster reticle changers and job-loading programs.
Both of the scanners incorporate SMIF (standard mechanical interface) and other automation features that enable a mini-environment for better contamination control and higher productivity. Still other features allow easier access to the machines and minimize the total usage of expensive clean room space.
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