Inprentus Has Been Awarded A Contract To Supply High-Precision Diffraction Gratings To The Semiconductor Industry For Metrology Applications

Inprentus will supply EUV Tech Inc. with custom designed blazed diffraction gratings for semiconductor metrology.

Champaign, IL (PRWEB) - A contract has been awarded to Inprentus to supply custom manufactured diffraction gratings. These unique diffraction gratings will be used as optical components for semiconductor EUV metrology instrumentation manufactured by EUV Tech Inc. Inprentus and EUV Tech worked together to optimize the design of the optical components to maximize the efficiency and optical characteristics for the semiconductor metrology application. Ron van Os, Inprentus’ CEO, noted “This second design and manufacturing opportunity with EUV Tech is evidence that Inprentus is delivering significant value to our customers by offering design optimization services along with our proven manufacturing expertise. Continued close customer engagement will continue to be a key strategy in reaching our goals.”

“Working with the team at Inprentus has allowed EUV Tech to significantly reduce our time to market in the development of a unique new EUV mask phase measurement tool while also providing state-of-the-art optical components,” said Patrick Naulleau, EUV Tech’s CEO.

EUV Tech Inc.
EUV Tech designs, manufactures, and delivers production of at-wavelength EUV metrology tools to the semiconductor industry. Established in 1997, the company is headquartered in Martinez, CA.

Inprentus Inc.
Inprentus designs manufactures, and sells X-ray and EUV diffraction gratings for synchrotron and free electron laser facilities as well as diffraction grating masters for augmented reality optics and spectroscopy applications. The company was founded in 2012 to commercialize an innovative, nano-scale scribing technology. This technology is a general-purpose approach to high-precision patterning of surfaces and is particularly suited to the manufacture of diffractive optics in which features must be shaped with 0.1-degree angular precision and positioned with nanometer precision over distances of tens of centimeters.