Anatech plasma cleaning, surface modification and etching systems are barrel, box and in-line configured for production throughput and R&D applications.

Anatech HUMMER® sputtering systems are configured for the deposition of metal and thin film in both R&D applications and low volume production. The first of over 5000 HUMMER® sputtering systems was delivered in 1970 by an Anatech founder and is still in active operation today.

Anatech manufactures its patented filamentless broad beam ion source. These sources are used by both production and R&D facilities for cleaning, surface modification and etching.

The company offers Casidiam® diamond like carbon thin film deposition services onto customer supplied parts.