MatrixMetrology Systems

The company offers its S200 systems for diffusion and thin-film deposition with MatrixMetrology, which provides an application-optimized set of metrology techniques. Both tools combine ultra-small-spot ellipsometry, microspot visible reflectometry, and integrated applications software customized for diffusion or thin-film deposition. They deliver a combination of robust pattern recognition, measurement speed, and thin-film measurement capabilities needed for these applications while at the same time providing a cost-effective solution for each process.

The MatrixMetrology approach enables customers to pick an assembly of advanced metrologies needed to meet the requirements for that particular process and leave off the technologies not needed. For example, the tool for diffusion must have good thin-film performance with a HeNe laser ellipsometer, a DUV reflectometer, and the high repeatability required for such ultrathin films. The S200 Diffusion system has one of the smallest (5x10 µm) ellipsometer spots with its 633, 780, and 458 nm HeNe laser ellipsometer for on-product measurement and a microspot (2.5 µm) visible reflectometer (470-905 nm) for high throughput (120 wph) film thickness measurement. In addition, it has a DUV (190-470 nm) reflectometer and High Repeatability Mode (HRM) with mili-Angstrom repeatability. The HRM option provides a repeatability of < 0.006 Å on 30 Å SiO₂ over 12 hours.

The S200 Thin Film system has a small-spot 633 and 780 nm ellipsometer, a microspot visible reflectometer, and a deep UV reflectometer for measuring anti-reflective coatings used in present and future lithography processes. Both S200 systems feature fast, robust Zheng patter recognition, which has superior performance on low-contrast wafers and excellent immunity to color and contrast variation.

The matrix of transparent film metrologies for the S200 and the 300 mm compatible S300 provides application-specific process control metrologies for ultrathin to very thick transparent films used in all modules across the modern semiconductor fab. Reliable pattern recognition; a fast, accurate X, T stage; a 2.5 µm diameter measuring spot; and a high signal-to-noise reflectometer enable 120 wph throughput and measurements within sites as small as 10µm. In addition, the 100 wph small-spot laser ellipsometer offers superior ellipsometer repeatability and stability.

Rudolph Technologies, Inc., One Rudolph Rd., Flanders, NJ 07836. Tel: 973-691-1300. Fax: 973-691-5480.