Polymeric Catalyst Based Filter System

Adhering to the technology that supports deep ultraviolet (UV) lithography operations, the company offers Vaposorb II, a line of polymeric catalyst based filter systems for molecular base control. The leading-edge molecular base filters were designed to directly replace both traditional track and stepper/scanner charcoal and ion exchange based filtration systems. The systems eliminate normal filter changes, a benefit which translates directly into improved tool uptime and reduced consumable costs.

The elimination of regular filter changes is a key feature of the Vaposorb II. Traditionally, a track or stepper/scanner tool requires from four to 24 hours to equilibrate after a filter change. The cost of an unproductive deep UV scanner and track cluster can reach or exceed $150,000 per hour- thereby incurring a massive, unrecoverable loss in revenue. As such, tool uptime is of paramount importance to the overall productivity of a fab.

The polymeric catalyst based filter systems offer a clean, long-life polymer structure that easily replaces existing systems, enabling fabs to readily capitalize on this technology. Vaposorb II systems have a normal service life exceeding four years, which substantially eliminates tool downtime.

The chemically amplified photoresists required for deep UV lithography are extremely sensitive to airborne molecular base contamination, which can cause anomalies in the submicron geometries printed on semiconductor wafers. This contamination reduces device yield, which in turn increases unit costs for integrated circuit production. The systems meet these production challenges while eliminating consumable costs.

Extraction Systems Inc., 10 Forge Park, Franklin, MA 02038. Tel: 800-992-0281 or 508-553-3900. Fax: 508-553-3901.