Freescale And Photronics Explore Paths To Faster, Cheaper And More Powerful Chips

Austin, TX -- As the industry approaches the limits of optical lithography, Freescale Semiconductor and Photronics have teamed up to assess the technical and commercial merit of specific resolution enhancement technologies intended to increase semiconductor customer profitability.

The joint exploratory development aims at extending the life of current-generation lithography tools to ensure the production of chips that are small, fast and powerful enough to enable pervasive computing and advanced wireless applications.

"The advanced development by Freescale and Photronics will be a significant influence on mass production of 65-nm CMOS devices and below," said Dr. Joe Mogab, senior technical fellow and director of the Advanced Products Research and Development Laboratory for Freescale. "Our joint advanced lithography work with Photronics will help provide us with the necessary RET improvements to provide the best and most cost-effective solutions for our customers' businesses."

The collaboration is a three-year commitment that began in Q404. Freescale supplies representative patterns and unique analytical support, wafer imaging and data analysis, while Photronics supplies test reticles and reticle fabrication details.

Christopher Progler, PhD, Photronics CTO, said, "There are inherent and interrelated challenges in design, photomask and lithography as semiconductor technology transitions to 90-nm, 65-nm and beyond. Our alliance with Freescale will play a significant role in expediting our customers' time-to-silicon, maintaining cost and improving chip yield."

SOURCE: Freescale Semiconductor/Photronics